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Automatic Release of Silicon Nanowire Arrays with a High Integrity for Flexible Electronic Devices
Automatic release and vertical transferring of silicon/silicon oxide nanowire arrays with a high integrity are demonstrated by an Ag-assisted ammonia etching method. By adding a water steaming step between Ag-assisted HF/H(2)O(2) and ammonia etching to form a SiO(x) protective layer sheathing Si nan...
Autores principales: | Wu, Luo, Li, Shuxin, He, Weiwei, Teng, Dayong, Wang, Ke, Ye, Changhui |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2014
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3909900/ https://www.ncbi.nlm.nih.gov/pubmed/24487460 http://dx.doi.org/10.1038/srep03940 |
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