Broadband antireflective silicon nanostructures produced by spin-coated Ag nanoparticles

We report the fabrication of broadband antireflective silicon (Si) nanostructures fabricated using spin-coated silver (Ag) nanoparticles as an etch mask followed by inductively coupled plasma (ICP) etching process. This fabrication technique is a simple, fast, cost-effective, and high-throughput met...

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Detalles Bibliográficos
Autores principales: Kim, Joon Beom, Yeo, Chan Il, Lee, Yong Hwan, Ravindran, Sooraj, Lee, Yong Tak
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3917369/
https://www.ncbi.nlm.nih.gov/pubmed/24484636
http://dx.doi.org/10.1186/1556-276X-9-54

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3917369/
https://www.ncbi.nlm.nih.gov/pubmed/24484636
http://dx.doi.org/10.1186/1556-276X-9-54

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