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Broadband antireflective silicon nanostructures produced by spin-coated Ag nanoparticles
We report the fabrication of broadband antireflective silicon (Si) nanostructures fabricated using spin-coated silver (Ag) nanoparticles as an etch mask followed by inductively coupled plasma (ICP) etching process. This fabrication technique is a simple, fast, cost-effective, and high-throughput met...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3917369/ https://www.ncbi.nlm.nih.gov/pubmed/24484636 http://dx.doi.org/10.1186/1556-276X-9-54 |