Maskless micro/nanofabrication on GaAs surface by friction-induced selective etching

In the present study, a friction-induced selective etching method was developed to produce nanostructures on GaAs surface. Without any resist mask, the nanofabrication can be achieved by scratching and post-etching in sulfuric acid solution. The effects of the applied normal load and etching period...

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Detalles Bibliográficos
Autores principales: Tang, Peng, Yu, Bingjun, Guo, Jian, Song, Chenfei, Qian, Linmao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3925353/
https://www.ncbi.nlm.nih.gov/pubmed/24495647
http://dx.doi.org/10.1186/1556-276X-9-59

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3925353/
https://www.ncbi.nlm.nih.gov/pubmed/24495647
http://dx.doi.org/10.1186/1556-276X-9-59

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