Growth and Etch Rate Study of Low Temperature Anodic Silicon Dioxide Thin Films

Silicon dioxide (SiO(2)) thin films are most commonly used insulating films in the fabrication of silicon-based integrated circuits (ICs) and microelectromechanical systems (MEMS). Several techniques with different processing environments have been investigated to deposit silicon dioxide films at te...

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Detalles Bibliográficos
Autores principales: Ashok, Akarapu, Pal, Prem
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Hindawi Publishing Corporation 2014
Materias:
Research Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3929520/
https://www.ncbi.nlm.nih.gov/pubmed/24672287
http://dx.doi.org/10.1155/2014/106029

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3929520/
https://www.ncbi.nlm.nih.gov/pubmed/24672287
http://dx.doi.org/10.1155/2014/106029

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