Cargando…
Growth and Etch Rate Study of Low Temperature Anodic Silicon Dioxide Thin Films
Silicon dioxide (SiO(2)) thin films are most commonly used insulating films in the fabrication of silicon-based integrated circuits (ICs) and microelectromechanical systems (MEMS). Several techniques with different processing environments have been investigated to deposit silicon dioxide films at te...
| Autores principales: | , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Hindawi Publishing Corporation
2014
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3929520/ https://www.ncbi.nlm.nih.gov/pubmed/24672287 http://dx.doi.org/10.1155/2014/106029 |