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Surface Morphology and Sensing Property of NiO-WO(3) Thin Films Prepared by Thermal Evaporation

WO(3) and NiO-WO(3) thin films of various thicknesses were deposited on an Al(2)O(3)-Si (alumina-silicon) substrate using high vacuum thermal evaporation. After annealing at 500°C for 30 minutes in air, the crystallanity and surface morphology of WO(3) and NiO-WO(3) thin films were investigated usin...

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Detalles Bibliográficos
Autores principales: Na, Dong-myong, Satyanarayana, L., Choi, Gwang-Pyo, Shin, Yong-Jin, Park, Jin Seong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Molecular Diversity Preservation International (MDPI) 2005
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3934686/