Fabrication of carbon nanomembranes by helium ion beam lithography

The irradiation-induced cross-linking of aromatic self-assembled monolayers (SAMs) is a universal method for the fabrication of ultrathin carbon nanomembranes (CNMs). Here we demonstrate the cross-linking of aromatic SAMs due to exposure to helium ions. The distinction of cross-linked from non-cross...

Descripción completa

Detalles Bibliográficos
Autores principales: Zhang, Xianghui, Vieker, Henning, Beyer, André, Gölzhäuser, Armin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2014
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3943867/
https://www.ncbi.nlm.nih.gov/pubmed/24605285
http://dx.doi.org/10.3762/bjnano.5.20

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3943867/
https://www.ncbi.nlm.nih.gov/pubmed/24605285
http://dx.doi.org/10.3762/bjnano.5.20

Ejemplares similares