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Fabrication of carbon nanomembranes by helium ion beam lithography

The irradiation-induced cross-linking of aromatic self-assembled monolayers (SAMs) is a universal method for the fabrication of ultrathin carbon nanomembranes (CNMs). Here we demonstrate the cross-linking of aromatic SAMs due to exposure to helium ions. The distinction of cross-linked from non-cross...

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Detalles Bibliográficos
Autores principales:	Zhang, Xianghui, Vieker, Henning, Beyer, André, Gölzhäuser, Armin
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Beilstein-Institut 2014
Materias:	Full Research Paper
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3943867/ https://www.ncbi.nlm.nih.gov/pubmed/24605285 http://dx.doi.org/10.3762/bjnano.5.20

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