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Quantum size effects in TiO(2) thin films grown by atomic layer deposition
We study the atomic layer deposition of TiO(2) by means of X-ray absorption spectroscopy. The Ti precursor, titanium isopropoxide, was used in combination with H(2)O on Si/SiO(2) substrates that were heated at 200 °C. The low growth rate (0.15 Å/cycle) and the in situ characterization permitted to f...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3943868/ https://www.ncbi.nlm.nih.gov/pubmed/24605275 http://dx.doi.org/10.3762/bjnano.5.7 |