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Quantum size effects in TiO(2) thin films grown by atomic layer deposition

We study the atomic layer deposition of TiO(2) by means of X-ray absorption spectroscopy. The Ti precursor, titanium isopropoxide, was used in combination with H(2)O on Si/SiO(2) substrates that were heated at 200 °C. The low growth rate (0.15 Å/cycle) and the in situ characterization permitted to f...

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Detalles Bibliográficos
Autores principales:	Tallarida, Massimo, Das, Chittaranjan, Schmeisser, Dieter
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Beilstein-Institut 2014
Materias:	Full Research Paper
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3943868/ https://www.ncbi.nlm.nih.gov/pubmed/24605275 http://dx.doi.org/10.3762/bjnano.5.7

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