Enhanced Temperature Control Method Using ANFIS with FPGA

Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develo...

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Detalles Bibliográficos
Autores principales: Huang, Chiung-Wei, Pan, Shing-Tai, Zhou, Jun-Tin, Chang, Cheng-Yuan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Hindawi Publishing Corporation 2014
Materias:
Research Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3971550/
https://www.ncbi.nlm.nih.gov/pubmed/24715808
http://dx.doi.org/10.1155/2014/239261

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3971550/
https://www.ncbi.nlm.nih.gov/pubmed/24715808
http://dx.doi.org/10.1155/2014/239261

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