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Enhanced Temperature Control Method Using ANFIS with FPGA
Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develo...
Autores principales: | Huang, Chiung-Wei, Pan, Shing-Tai, Zhou, Jun-Tin, Chang, Cheng-Yuan |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Hindawi Publishing Corporation
2014
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3971550/ https://www.ncbi.nlm.nih.gov/pubmed/24715808 http://dx.doi.org/10.1155/2014/239261 |
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