Structural and mechanical evolution of reactively and non-reactively sputtered Zr–Al–N thin films during annealing()

The influence of reactive and non-reactive sputtering on structure, mechanical properties, and thermal stability of Zr(1 − x)Al(x)N thin films during annealing to 1500 °C is investigated in detail. Reactive sputtering of a Zr(0.6)Al(0.4) target leads to the formation of Zr(0.66)Al(0.34)N thin films,...

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Detalles Bibliográficos
Autores principales: Mayrhofer, P.H., Sonnleitner, D., Bartosik, M., Holec, D.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Elsevier Sequoia 2014
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3990427/
https://www.ncbi.nlm.nih.gov/pubmed/24748705
http://dx.doi.org/10.1016/j.surfcoat.2014.01.049

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3990427/
https://www.ncbi.nlm.nih.gov/pubmed/24748705
http://dx.doi.org/10.1016/j.surfcoat.2014.01.049

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