Nanoscale patterning of a self-assembled monolayer by modification of the molecule–substrate bond

The intercalation of Cu at the interface of a self-assembled monolayer (SAM) and a Au(111)/mica substrate by underpotential deposition (UPD) is studied as a means of high resolution patterning. A SAM of 2-(4'-methylbiphenyl-4-yl)ethanethiol (BP2) prepared in a structural phase that renders the...

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Detalles Bibliográficos
Autores principales: Shen, Cai, Buck, Manfred
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2014
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3999799/
https://www.ncbi.nlm.nih.gov/pubmed/24778947
http://dx.doi.org/10.3762/bjnano.5.28

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3999799/
https://www.ncbi.nlm.nih.gov/pubmed/24778947
http://dx.doi.org/10.3762/bjnano.5.28

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