Direct fabrication of graphene on SiO(2) enabled by thin film stress engineering

We demonstrate direct production of graphene on SiO(2) by CVD growth of graphene at the interface between a Ni film and the SiO(2) substrate, followed by dry mechanical delamination of the Ni using adhesive tape. This result is enabled by understanding of the competition between stress evolution and...

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Detalles Bibliográficos
Autores principales: McNerny, Daniel Q., Viswanath, B., Copic, Davor, Laye, Fabrice R., Prohoda, Christophor, Brieland-Shoultz, Anna C., Polsen, Erik S., Dee, Nicholas T., Veerasamy, Vijayen S., Hart, A. John
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2014
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4031480/
https://www.ncbi.nlm.nih.gov/pubmed/24854632
http://dx.doi.org/10.1038/srep05049

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4031480/
https://www.ncbi.nlm.nih.gov/pubmed/24854632
http://dx.doi.org/10.1038/srep05049

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