Nanofabrication on monocrystalline silicon through friction-induced selective etching of Si(3)N(4) mask

A new fabrication method is proposed to produce nanostructures on monocrystalline silicon based on the friction-induced selective etching of its Si(3)N(4) mask. With low-pressure chemical vapor deposition (LPCVD) Si(3)N(4) film as etching mask on Si(100) surface, the fabrication can be realized by n...

Descripción completa

Detalles Bibliográficos
Autores principales: Guo, Jian, Yu, Bingjun, Wang, Xiaodong, Qian, Linmao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4036082/
https://www.ncbi.nlm.nih.gov/pubmed/24940174
http://dx.doi.org/10.1186/1556-276X-9-241

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4036082/
https://www.ncbi.nlm.nih.gov/pubmed/24940174
http://dx.doi.org/10.1186/1556-276X-9-241

Ejemplares similares