Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor

A widely used application of the atomic layer deposition (ALD) and chemical vapour deposition (CVD) methods is the preparation of permeation barrier layers against water vapour. Especially in the field of organic electronics, these films are highly demanded as such devices are very sensitive to mois...

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Detalles Bibliográficos
Autores principales: Bülow, Tim, Gargouri, Hassan, Siebert, Mirko, Rudolph, Rolf, Johannes, Hans-Hermann, Kowalsky, Wolfgang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4047440/
https://www.ncbi.nlm.nih.gov/pubmed/24936155
http://dx.doi.org/10.1186/1556-276X-9-223

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4047440/
https://www.ncbi.nlm.nih.gov/pubmed/24936155
http://dx.doi.org/10.1186/1556-276X-9-223

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