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Aluminum silicide microparticles transformed from aluminum thin films by hypoeutectic interdiffusion

Aluminum silicide microparticles with oxidized rough surfaces were formed on Si substrates through a spontaneous granulation process of Al films. This microparticle formation was caused by interdiffusion of Al and Si atoms at hypoeutectic temperatures of Al-Si systems, which was driven by compressiv...

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Detalles Bibliográficos
Autor principal: Noh, Jin-Seo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4074387/
https://www.ncbi.nlm.nih.gov/pubmed/24994964
http://dx.doi.org/10.1186/1556-276X-9-312