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Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials
Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this paper, we describe the fabrication proces...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4077317/ https://www.ncbi.nlm.nih.gov/pubmed/24991494 http://dx.doi.org/10.3762/bjnano.5.68 |