Encapsulated Annealing: Enhancing the Plasmon Quality Factor in Lithographically–Defined Nanostructures

Lithography provides the precision to pattern large arrays of metallic nanostructures with varying geometries, enabling systematic studies and discoveries of new phenomena in plasmonics. However, surface plasmon resonances experience more damping in lithographically–defined structures than in chemic...

Descripción completa

Detalles Bibliográficos
Autores principales: Bosman, Michel, Zhang, Lei, Duan, Huigao, Tan, Shu Fen, Nijhuis, Christian A., Qiu, Cheng–Wei, Yang, Joel K. W.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2014
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4078311/
https://www.ncbi.nlm.nih.gov/pubmed/24986023
http://dx.doi.org/10.1038/srep05537

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4078311/
https://www.ncbi.nlm.nih.gov/pubmed/24986023
http://dx.doi.org/10.1038/srep05537

Ejemplares similares