Pushing the resolution of photolithography down to 15nm by surface plasmon interference

A deep ultraviolet plasmonic structure is designed and a surface plasmon interference lithography method using the structure is proposed to generate large-area periodic nanopatterns. By exciting the anti-symmetric coupled surface plasmon polaritons in the structure, ultrahigh resolution periodic pat...

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Detalles Bibliográficos
Autores principales: Dong, Jianjie, Liu, Juan, Kang, Guoguo, Xie, Jinghui, Wang, Yongtian
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2014
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4085591/
https://www.ncbi.nlm.nih.gov/pubmed/25001238
http://dx.doi.org/10.1038/srep05618

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4085591/
https://www.ncbi.nlm.nih.gov/pubmed/25001238
http://dx.doi.org/10.1038/srep05618

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