Cargando…

Pushing the resolution of photolithography down to 15nm by surface plasmon interference

A deep ultraviolet plasmonic structure is designed and a surface plasmon interference lithography method using the structure is proposed to generate large-area periodic nanopatterns. By exciting the anti-symmetric coupled surface plasmon polaritons in the structure, ultrahigh resolution periodic pat...

Descripción completa

Detalles Bibliográficos
Autores principales: Dong, Jianjie, Liu, Juan, Kang, Guoguo, Xie, Jinghui, Wang, Yongtian
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2014
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4085591/
https://www.ncbi.nlm.nih.gov/pubmed/25001238
http://dx.doi.org/10.1038/srep05618
_version_ 1782324684242550784
author Dong, Jianjie
Liu, Juan
Kang, Guoguo
Xie, Jinghui
Wang, Yongtian
author_facet Dong, Jianjie
Liu, Juan
Kang, Guoguo
Xie, Jinghui
Wang, Yongtian
author_sort Dong, Jianjie
collection PubMed
description A deep ultraviolet plasmonic structure is designed and a surface plasmon interference lithography method using the structure is proposed to generate large-area periodic nanopatterns. By exciting the anti-symmetric coupled surface plasmon polaritons in the structure, ultrahigh resolution periodic patterns can be formed in a photoresist. The resolution of the generated patterns can be tuned by changing the refractive index and thickness of the photoresist. We demonstrate numerically that one-dimensional and two-dimensional patterns with a half-pitch resolution of 14.6 nm can be generated in a 25 nm-thick photoresist by using the structure under 193 nm illumination. Furthermore, the half-pitch resolution of the generated patterns can be down to 13 nm if high refractive index photoresists are used. Our findings open up an avenue to push the half-pitch resolution of photolithography towards 10 nm.
format Online
Article
Text
id pubmed-4085591
institution National Center for Biotechnology Information
language English
publishDate 2014
publisher Nature Publishing Group
record_format MEDLINE/PubMed
spelling pubmed-40855912014-07-09 Pushing the resolution of photolithography down to 15nm by surface plasmon interference Dong, Jianjie Liu, Juan Kang, Guoguo Xie, Jinghui Wang, Yongtian Sci Rep Article A deep ultraviolet plasmonic structure is designed and a surface plasmon interference lithography method using the structure is proposed to generate large-area periodic nanopatterns. By exciting the anti-symmetric coupled surface plasmon polaritons in the structure, ultrahigh resolution periodic patterns can be formed in a photoresist. The resolution of the generated patterns can be tuned by changing the refractive index and thickness of the photoresist. We demonstrate numerically that one-dimensional and two-dimensional patterns with a half-pitch resolution of 14.6 nm can be generated in a 25 nm-thick photoresist by using the structure under 193 nm illumination. Furthermore, the half-pitch resolution of the generated patterns can be down to 13 nm if high refractive index photoresists are used. Our findings open up an avenue to push the half-pitch resolution of photolithography towards 10 nm. Nature Publishing Group 2014-07-08 /pmc/articles/PMC4085591/ /pubmed/25001238 http://dx.doi.org/10.1038/srep05618 Text en Copyright © 2014, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-nd/4.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International License. The images or other third party material in this article are included in the article's Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder in order to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-nd/4.0/
spellingShingle Article
Dong, Jianjie
Liu, Juan
Kang, Guoguo
Xie, Jinghui
Wang, Yongtian
Pushing the resolution of photolithography down to 15nm by surface plasmon interference
title Pushing the resolution of photolithography down to 15nm by surface plasmon interference
title_full Pushing the resolution of photolithography down to 15nm by surface plasmon interference
title_fullStr Pushing the resolution of photolithography down to 15nm by surface plasmon interference
title_full_unstemmed Pushing the resolution of photolithography down to 15nm by surface plasmon interference
title_short Pushing the resolution of photolithography down to 15nm by surface plasmon interference
title_sort pushing the resolution of photolithography down to 15nm by surface plasmon interference
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4085591/
https://www.ncbi.nlm.nih.gov/pubmed/25001238
http://dx.doi.org/10.1038/srep05618
work_keys_str_mv AT dongjianjie pushingtheresolutionofphotolithographydownto15nmbysurfaceplasmoninterference
AT liujuan pushingtheresolutionofphotolithographydownto15nmbysurfaceplasmoninterference
AT kangguoguo pushingtheresolutionofphotolithographydownto15nmbysurfaceplasmoninterference
AT xiejinghui pushingtheresolutionofphotolithographydownto15nmbysurfaceplasmoninterference
AT wangyongtian pushingtheresolutionofphotolithographydownto15nmbysurfaceplasmoninterference