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Pushing the resolution of photolithography down to 15nm by surface plasmon interference
A deep ultraviolet plasmonic structure is designed and a surface plasmon interference lithography method using the structure is proposed to generate large-area periodic nanopatterns. By exciting the anti-symmetric coupled surface plasmon polaritons in the structure, ultrahigh resolution periodic pat...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2014
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4085591/ https://www.ncbi.nlm.nih.gov/pubmed/25001238 http://dx.doi.org/10.1038/srep05618 |
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author | Dong, Jianjie Liu, Juan Kang, Guoguo Xie, Jinghui Wang, Yongtian |
author_facet | Dong, Jianjie Liu, Juan Kang, Guoguo Xie, Jinghui Wang, Yongtian |
author_sort | Dong, Jianjie |
collection | PubMed |
description | A deep ultraviolet plasmonic structure is designed and a surface plasmon interference lithography method using the structure is proposed to generate large-area periodic nanopatterns. By exciting the anti-symmetric coupled surface plasmon polaritons in the structure, ultrahigh resolution periodic patterns can be formed in a photoresist. The resolution of the generated patterns can be tuned by changing the refractive index and thickness of the photoresist. We demonstrate numerically that one-dimensional and two-dimensional patterns with a half-pitch resolution of 14.6 nm can be generated in a 25 nm-thick photoresist by using the structure under 193 nm illumination. Furthermore, the half-pitch resolution of the generated patterns can be down to 13 nm if high refractive index photoresists are used. Our findings open up an avenue to push the half-pitch resolution of photolithography towards 10 nm. |
format | Online Article Text |
id | pubmed-4085591 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2014 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-40855912014-07-09 Pushing the resolution of photolithography down to 15nm by surface plasmon interference Dong, Jianjie Liu, Juan Kang, Guoguo Xie, Jinghui Wang, Yongtian Sci Rep Article A deep ultraviolet plasmonic structure is designed and a surface plasmon interference lithography method using the structure is proposed to generate large-area periodic nanopatterns. By exciting the anti-symmetric coupled surface plasmon polaritons in the structure, ultrahigh resolution periodic patterns can be formed in a photoresist. The resolution of the generated patterns can be tuned by changing the refractive index and thickness of the photoresist. We demonstrate numerically that one-dimensional and two-dimensional patterns with a half-pitch resolution of 14.6 nm can be generated in a 25 nm-thick photoresist by using the structure under 193 nm illumination. Furthermore, the half-pitch resolution of the generated patterns can be down to 13 nm if high refractive index photoresists are used. Our findings open up an avenue to push the half-pitch resolution of photolithography towards 10 nm. Nature Publishing Group 2014-07-08 /pmc/articles/PMC4085591/ /pubmed/25001238 http://dx.doi.org/10.1038/srep05618 Text en Copyright © 2014, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-nd/4.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International License. The images or other third party material in this article are included in the article's Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder in order to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-nd/4.0/ |
spellingShingle | Article Dong, Jianjie Liu, Juan Kang, Guoguo Xie, Jinghui Wang, Yongtian Pushing the resolution of photolithography down to 15nm by surface plasmon interference |
title | Pushing the resolution of photolithography down to 15nm by surface plasmon interference |
title_full | Pushing the resolution of photolithography down to 15nm by surface plasmon interference |
title_fullStr | Pushing the resolution of photolithography down to 15nm by surface plasmon interference |
title_full_unstemmed | Pushing the resolution of photolithography down to 15nm by surface plasmon interference |
title_short | Pushing the resolution of photolithography down to 15nm by surface plasmon interference |
title_sort | pushing the resolution of photolithography down to 15nm by surface plasmon interference |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4085591/ https://www.ncbi.nlm.nih.gov/pubmed/25001238 http://dx.doi.org/10.1038/srep05618 |
work_keys_str_mv | AT dongjianjie pushingtheresolutionofphotolithographydownto15nmbysurfaceplasmoninterference AT liujuan pushingtheresolutionofphotolithographydownto15nmbysurfaceplasmoninterference AT kangguoguo pushingtheresolutionofphotolithographydownto15nmbysurfaceplasmoninterference AT xiejinghui pushingtheresolutionofphotolithographydownto15nmbysurfaceplasmoninterference AT wangyongtian pushingtheresolutionofphotolithographydownto15nmbysurfaceplasmoninterference |