Fluorinated Graphene as High Performance Dielectric Materials and the Applications for Graphene Nanoelectronics

There is broad interest in surface functionalization of 2D materials and its related applications. In this work, we present a novel graphene layer transistor fabricated by introducing fluorinated graphene (fluorographene), one of the thinnest 2D insulator, as the gate dielectric material. For the fi...

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Detalles Bibliográficos
Autores principales: Ho, Kuan-I, Huang, Chi-Hsien, Liao, Jia-Hong, Zhang, Wenjing, Li, Lain-Jong, Lai, Chao-Sung, Su, Ching-Yuan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2014
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4118181/
https://www.ncbi.nlm.nih.gov/pubmed/25081226
http://dx.doi.org/10.1038/srep05893

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4118181/
https://www.ncbi.nlm.nih.gov/pubmed/25081226
http://dx.doi.org/10.1038/srep05893

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