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Fluorinated Graphene as High Performance Dielectric Materials and the Applications for Graphene Nanoelectronics
There is broad interest in surface functionalization of 2D materials and its related applications. In this work, we present a novel graphene layer transistor fabricated by introducing fluorinated graphene (fluorographene), one of the thinnest 2D insulator, as the gate dielectric material. For the fi...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4118181/ https://www.ncbi.nlm.nih.gov/pubmed/25081226 http://dx.doi.org/10.1038/srep05893 |