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Organic and inorganic–organic thin film structures by molecular layer deposition: A review
The possibility to deposit purely organic and hybrid inorganic–organic materials in a way parallel to the state-of-the-art gas-phase deposition method of inorganic thin films, i.e., atomic layer deposition (ALD), is currently experiencing a strongly growing interest. Like ALD in case of the inorgani...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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Beilstein-Institut
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4143120/ https://www.ncbi.nlm.nih.gov/pubmed/25161845 http://dx.doi.org/10.3762/bjnano.5.123 |