Released micromachined beams utilizing laterally uniform porosity porous silicon

Suspended micromachined porous silicon beams with laterally uniform porosity are reported, which have been fabricated using standard photolithography processes designed for compatibility with complementary metal-oxide-semiconductor (CMOS) processes. Anodization, annealing, reactive ion etching, repe...

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Detalles Bibliográficos
Autores principales: Sun, Xiao, Keating, Adrian, Parish, Giacinta
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4151280/
https://www.ncbi.nlm.nih.gov/pubmed/25221457
http://dx.doi.org/10.1186/1556-276X-9-426

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4151280/
https://www.ncbi.nlm.nih.gov/pubmed/25221457
http://dx.doi.org/10.1186/1556-276X-9-426

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