Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

A general concept for parallel near-field photochemical and radiation-induced chemical processes for the fabrication of nanopatterns of a self-assembled monolayer (SAM) of (3-aminopropyl)triethoxysilane (APTES) is explored with three different processes: 1) a near-field photochemical process by phot...

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Detalles Bibliográficos
Autores principales: Fischer, Ulrich Christian, Hentschel, Carsten, Fontein, Florian, Stegemann, Linda, Hoeppener, Christiane, Fuchs, Harald, Hoeppener, Stefanie
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2014
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4168865/
https://www.ncbi.nlm.nih.gov/pubmed/25247126
http://dx.doi.org/10.3762/bjnano.5.156

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4168865/
https://www.ncbi.nlm.nih.gov/pubmed/25247126
http://dx.doi.org/10.3762/bjnano.5.156

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