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Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer
A general concept for parallel near-field photochemical and radiation-induced chemical processes for the fabrication of nanopatterns of a self-assembled monolayer (SAM) of (3-aminopropyl)triethoxysilane (APTES) is explored with three different processes: 1) a near-field photochemical process by phot...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4168865/ https://www.ncbi.nlm.nih.gov/pubmed/25247126 http://dx.doi.org/10.3762/bjnano.5.156 |