Effect of sulfur hexafluoride gas and post-annealing treatment for inductively coupled plasma etched barium titanate thin films

Aerosol deposition- (AD) derived barium titanate (BTO) micropatterns are etched via SF(6)/O(2)/Ar plasmas using inductively coupled plasma (ICP) etching technology. The reaction mechanisms of the sulfur hexafluoride on BTO thin films and the effects of annealing treatment are verified through X-ray...

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Detalles Bibliográficos
Autores principales: Wang, Cong, Li, Yang, Yao, Zhao, Kim, Hong-Ki, Kim, Hyung-Jun, Kim, Nam-Young
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4171574/
https://www.ncbi.nlm.nih.gov/pubmed/25249824
http://dx.doi.org/10.1186/1556-276X-9-496

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4171574/
https://www.ncbi.nlm.nih.gov/pubmed/25249824
http://dx.doi.org/10.1186/1556-276X-9-496

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