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Comparative analysis of barium titanate thin films dry etching using inductively coupled plasmas by different fluorine-based mixture gas
In this work, the inductively coupled plasma etching technique was applied to etch the barium titanate thin film. A comparative study of etch characteristics of the barium titanate thin film has been investigated in fluorine-based (CF(4)/O(2), C(4)F(8)/O(2) and SF(6)/O(2)) plasmas. The etch rates we...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4182282/ https://www.ncbi.nlm.nih.gov/pubmed/25278821 http://dx.doi.org/10.1186/1556-276X-9-530 |