Compositional and optical properties of SiO( x ) films and (SiO( x )/SiO( y )) junctions deposited by HFCVD

In this work, non-stoichiometric silicon oxide (SiO( x )) films and (SiO( x )/SiO( y )) junctions, as-grown and after further annealing, are characterized by different techniques. The SiO( x ) films and (SiO( x )/SiO( y )) junctions are obtained by hot filament chemical vapor deposition technique in...

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Detalles Bibliográficos
Autores principales: Vázquez-Valerdi, Diana E, Luna-López, Jose A, Carrillo-López, Jesús, García-Salgado, Godofredo, Benítez-Lara, Alfredo, Espinosa-Torres, Néstor D
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4207100/
https://www.ncbi.nlm.nih.gov/pubmed/25342935
http://dx.doi.org/10.1186/1556-276X-9-422

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4207100/
https://www.ncbi.nlm.nih.gov/pubmed/25342935
http://dx.doi.org/10.1186/1556-276X-9-422

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