Versatile pattern generation of periodic, high aspect ratio Si nanostructure arrays with sub-50-nm resolution on a wafer scale

We report on a method of fabricating variable patterns of periodic, high aspect ratio silicon nanostructures with sub-50-nm resolution on a wafer scale. The approach marries step-and-repeat nanoimprint lithography (NIL) and metal-catalyzed electroless etching (MCEE), enabling near perfectly ordered...

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Detalles Bibliográficos
Autores principales: Ho, Jian-Wei, Wee, Qixun, Dumond, Jarrett, Tay, Andrew, Chua, Soo-Jin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4219178/
https://www.ncbi.nlm.nih.gov/pubmed/24289275
http://dx.doi.org/10.1186/1556-276X-8-506

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4219178/
https://www.ncbi.nlm.nih.gov/pubmed/24289275
http://dx.doi.org/10.1186/1556-276X-8-506

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