High speed e-beam lithography for gold nanoarray fabrication and use in nanotechnology

E-beam lithography has been used for reliable and versatile fabrication of sub-15 nm single-crystal gold nanoarrays and led to convincing applications in nanotechnology. However, so far this technique was either too slow for centimeter to wafer-scale writing or fast enough with the so-called dot on...

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Detalles Bibliográficos
Autores principales: Trasobares, Jorge, Vaurette, François, François, Marc, Romijn, Hans, Codron, Jean-Louis, Vuillaume, Dominique, Théron, Didier, Clément, Nicolas
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2014
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4222405/
https://www.ncbi.nlm.nih.gov/pubmed/25383303
http://dx.doi.org/10.3762/bjnano.5.202

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4222405/
https://www.ncbi.nlm.nih.gov/pubmed/25383303
http://dx.doi.org/10.3762/bjnano.5.202

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