Large-scale fabrication of nanopatterned sapphire substrates by annealing of patterned Al thin films by soft UV-nanoimprint lithography

Large-scale nanopatterned sapphire substrates were fabricated by annealing of patterned Al thin films. Patterned Al thin films were obtained by soft UV-nanoimprint lithography and reactive ion etching. The soft mold with 550-nm-wide lines separated by 250-nm space was composed of the toluene-diluted...

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Detalles Bibliográficos
Autores principales: Cui, Lin, Han, Jie-Cai, Wang, Gui-Gen, Zhang, Hua-Yu, Sun, Rui, Li, Ling-Hua
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4225748/
https://www.ncbi.nlm.nih.gov/pubmed/24215718
http://dx.doi.org/10.1186/1556-276X-8-472

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4225748/
https://www.ncbi.nlm.nih.gov/pubmed/24215718
http://dx.doi.org/10.1186/1556-276X-8-472

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