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Homogeneous crystalline FeSi(2) films of c (4 × 8) phase grown on Si (111) by reactive deposition epitaxy

The growth of iron silicides on Si (111) using reactive deposition epitaxy method was studied by scanning tunneling microscopy and X-ray photoelectron spectroscopy (XPS). Instead of the mixture of different silicide phases, a homogeneous crystalline film of c (4 × 8) phase was formed on the Si (111)...

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Detalles Bibliográficos
Autores principales: Zou, Zhi-Qiang, Sun, Li-Min, Shi, Gao-Ming, Liu, Xiao-Yong, Li, Xu
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4234272/
https://www.ncbi.nlm.nih.gov/pubmed/24305438
http://dx.doi.org/10.1186/1556-276X-8-510

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