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Formation of nanostructured silicon surfaces by stain etching
In this work, we report the fabrication of ordered silicon structures by chemical etching of silicon in vanadium oxide (V(2)O(5))/hydrofluoric acid (HF) solution. The effects of the different etching parameters including the solution concentration, temperature, and the presence of metal catalyst fil...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4242786/ https://www.ncbi.nlm.nih.gov/pubmed/25435830 http://dx.doi.org/10.1186/1556-276X-9-482 |