Monitoring the thin film formation during sputter deposition of vanadium carbide

The thin film formation of magnetron sputtered polycrystalline coatings was monitored by in situ X-ray reflectivity measurements. The measured intensity was analyzed using the Parratt algorithm for time-dependent thin film systems. Guidelines for the on-line interpretation of the data were developed...

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Detalles Bibliográficos
Autores principales: Kaufholz, Marthe, Krause, Bärbel, Kotapati, Sunil, Köhl, Martin, Mantilla, Miguel F., Stüber, Michael, Ulrich, Sven, Schneider, Reinhard, Gerthsen, Dagmar, Baumbach, Tilo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: International Union of Crystallography 2015
Materias:
Research Papers
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4294025/
https://www.ncbi.nlm.nih.gov/pubmed/25537591
http://dx.doi.org/10.1107/S1600577514024412

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4294025/
https://www.ncbi.nlm.nih.gov/pubmed/25537591
http://dx.doi.org/10.1107/S1600577514024412

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