In Situ Observations during Chemical Vapor Deposition of Hexagonal Boron Nitride on Polycrystalline Copper

[Image: see text] Using a combination of complementary in situ X-ray photoelectron spectroscopy and X-ray diffraction, we study the fundamental mechanisms underlying the chemical vapor deposition (CVD) of hexagonal boron nitride (h-BN) on polycrystalline Cu. The nucleation and growth of h-BN layers...

Descripción completa

Detalles Bibliográficos
Autores principales: Kidambi, Piran R., Blume, Raoul, Kling, Jens, Wagner, Jakob B., Baehtz, Carsten, Weatherup, Robert S., Schloegl, Robert, Bayer, Bernhard C., Hofmann, Stephan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2014
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4311958/
https://www.ncbi.nlm.nih.gov/pubmed/25673919
http://dx.doi.org/10.1021/cm502603n

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4311958/
https://www.ncbi.nlm.nih.gov/pubmed/25673919
http://dx.doi.org/10.1021/cm502603n

Ejemplares similares