Beyond EUV lithography: a comparative study of efficient photoresists' performance

Extreme ultraviolet (EUV) lithography at 13.5 nm is the main candidate for patterning integrated circuits and reaching sub-10-nm resolution within the next decade. Should photon-based lithography still be used for patterning smaller feature sizes, beyond EUV (BEUV) lithography at 6.x nm wavelength i...

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Detalles Bibliográficos
Autores principales: Mojarad, Nassir, Gobrecht, Jens, Ekinci, Yasin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4363827/
https://www.ncbi.nlm.nih.gov/pubmed/25783209
http://dx.doi.org/10.1038/srep09235

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4363827/
https://www.ncbi.nlm.nih.gov/pubmed/25783209
http://dx.doi.org/10.1038/srep09235

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