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Micropatterning of TiO(2) Thin Films by MOCVD and Study of Their Growth Tendency
In this work, we studied the growth tendency of TiO(2) thin films deposited on a narrow-stripe area (<10 μm). TiO(2) thin films were selectively deposited on OTS patterned Si(100) substrates by MOCVD. The experimental data showed that the film growth tendency was divided into two behaviors above...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group
2015
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4370045/ https://www.ncbi.nlm.nih.gov/pubmed/25799219 http://dx.doi.org/10.1038/srep09319 |