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Micropatterning of TiO(2) Thin Films by MOCVD and Study of Their Growth Tendency

In this work, we studied the growth tendency of TiO(2) thin films deposited on a narrow-stripe area (<10 μm). TiO(2) thin films were selectively deposited on OTS patterned Si(100) substrates by MOCVD. The experimental data showed that the film growth tendency was divided into two behaviors above...

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Detalles Bibliográficos
Autores principales:	Hwang, Ki-Hwan, Kang, Byung-Chang, Jung, Duk Young, Kim, Youn Jea, Boo, Jin-Hyo
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Nature Publishing Group 2015
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4370045/ https://www.ncbi.nlm.nih.gov/pubmed/25799219 http://dx.doi.org/10.1038/srep09319

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