The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

The aluminum oxide (Al(2)O(3)) thin films with various thicknesses under 50 nm were deposited by atomic layer deposition (ALD) on silicon substrate. The surface topography investigated by atomic force microscopy (AFM) revealed that the samples were smooth and crack-free. The ellipsometric spectra of...

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Detalles Bibliográficos
Autores principales: Wang, Zi-Yi, Zhang, Rong-Jun, Lu, Hong-Liang, Chen, Xin, Sun, Yan, Zhang, Yun, Wei, Yan-Feng, Xu, Ji-Ping, Wang, Song-You, Zheng, Yu-Xiang, Chen, Liang-Yao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2015
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4384924/
https://www.ncbi.nlm.nih.gov/pubmed/25852343
http://dx.doi.org/10.1186/s11671-015-0757-y

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4384924/
https://www.ncbi.nlm.nih.gov/pubmed/25852343
http://dx.doi.org/10.1186/s11671-015-0757-y

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