Dynamics of mass transport during nanohole drilling by local droplet etching

Local droplet etching (LDE) utilizes metal droplets during molecular beam epitaxy for the self-assembled drilling of nanoholes into III/V semiconductor surfaces. An essential process during LDE is the removal of the deposited droplet material from its initial position during post-growth annealing. T...

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Detalles Bibliográficos
Autores principales: Heyn, Christian, Bartsch, Thorben, Sanguinetti, Stefano, Jesson, David, Hansen, Wolfgang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2015
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4385027/
https://www.ncbi.nlm.nih.gov/pubmed/25852364
http://dx.doi.org/10.1186/s11671-015-0779-5

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4385027/
https://www.ncbi.nlm.nih.gov/pubmed/25852364
http://dx.doi.org/10.1186/s11671-015-0779-5

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