Optical properties and bandgap evolution of ALD HfSiO(x) films

Hafnium silicate films with pure HfO(2) and SiO(2) samples as references were fabricated by atomic layer deposition (ALD) in this work. The optical properties of the films as a function of the film composition were measured by vacuum ultraviolet (VUV) ellipsometer in the energy range of 0.6 to 8.5 e...

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Detalles Bibliográficos
Autores principales: Yang, Wen, Fronk, Michael, Geng, Yang, Chen, Lin, Sun, Qing-Qing, Gordan, Ovidiu D, zhou, Peng, Zahn, Dietrich RT, Zhang, David Wei
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2015
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4385042/
https://www.ncbi.nlm.nih.gov/pubmed/25852329
http://dx.doi.org/10.1186/s11671-014-0724-z
_version_ 1782365000525938688
author Yang, Wen
Fronk, Michael
Geng, Yang
Chen, Lin
Sun, Qing-Qing
Gordan, Ovidiu D
zhou, Peng
Zahn, Dietrich RT
Zhang, David Wei
author_facet Yang, Wen
Fronk, Michael
Geng, Yang
Chen, Lin
Sun, Qing-Qing
Gordan, Ovidiu D
zhou, Peng
Zahn, Dietrich RT
Zhang, David Wei
author_sort Yang, Wen
collection PubMed
description Hafnium silicate films with pure HfO(2) and SiO(2) samples as references were fabricated by atomic layer deposition (ALD) in this work. The optical properties of the films as a function of the film composition were measured by vacuum ultraviolet (VUV) ellipsometer in the energy range of 0.6 to 8.5 eV, and they were investigated systematically based on the Gaussian dispersion model. Experimental results show that optical constants and bandgap of the hafnium silicate films can be tuned by the film composition, and a nonlinear change behavior of bandgap with SiO(2) fraction was observed. This phenomenon mainly originates from the intermixture of d-state electrons in HfO(2) and Si-O antibonding states in SiO(2).
format Online
Article
Text
id pubmed-4385042
institution National Center for Biotechnology Information
language English
publishDate 2015
publisher Springer US
record_format MEDLINE/PubMed
spelling pubmed-43850422015-04-07 Optical properties and bandgap evolution of ALD HfSiO(x) films Yang, Wen Fronk, Michael Geng, Yang Chen, Lin Sun, Qing-Qing Gordan, Ovidiu D zhou, Peng Zahn, Dietrich RT Zhang, David Wei Nanoscale Res Lett Nano Express Hafnium silicate films with pure HfO(2) and SiO(2) samples as references were fabricated by atomic layer deposition (ALD) in this work. The optical properties of the films as a function of the film composition were measured by vacuum ultraviolet (VUV) ellipsometer in the energy range of 0.6 to 8.5 eV, and they were investigated systematically based on the Gaussian dispersion model. Experimental results show that optical constants and bandgap of the hafnium silicate films can be tuned by the film composition, and a nonlinear change behavior of bandgap with SiO(2) fraction was observed. This phenomenon mainly originates from the intermixture of d-state electrons in HfO(2) and Si-O antibonding states in SiO(2). Springer US 2015-02-05 /pmc/articles/PMC4385042/ /pubmed/25852329 http://dx.doi.org/10.1186/s11671-014-0724-z Text en © Yang et al.; licensee Springer. 2015 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly credited.
spellingShingle Nano Express
Yang, Wen
Fronk, Michael
Geng, Yang
Chen, Lin
Sun, Qing-Qing
Gordan, Ovidiu D
zhou, Peng
Zahn, Dietrich RT
Zhang, David Wei
Optical properties and bandgap evolution of ALD HfSiO(x) films
title Optical properties and bandgap evolution of ALD HfSiO(x) films
title_full Optical properties and bandgap evolution of ALD HfSiO(x) films
title_fullStr Optical properties and bandgap evolution of ALD HfSiO(x) films
title_full_unstemmed Optical properties and bandgap evolution of ALD HfSiO(x) films
title_short Optical properties and bandgap evolution of ALD HfSiO(x) films
title_sort optical properties and bandgap evolution of ald hfsio(x) films
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4385042/
https://www.ncbi.nlm.nih.gov/pubmed/25852329
http://dx.doi.org/10.1186/s11671-014-0724-z
work_keys_str_mv AT yangwen opticalpropertiesandbandgapevolutionofaldhfsioxfilms
AT fronkmichael opticalpropertiesandbandgapevolutionofaldhfsioxfilms
AT gengyang opticalpropertiesandbandgapevolutionofaldhfsioxfilms
AT chenlin opticalpropertiesandbandgapevolutionofaldhfsioxfilms
AT sunqingqing opticalpropertiesandbandgapevolutionofaldhfsioxfilms
AT gordanovidiud opticalpropertiesandbandgapevolutionofaldhfsioxfilms
AT zhoupeng opticalpropertiesandbandgapevolutionofaldhfsioxfilms
AT zahndietrichrt opticalpropertiesandbandgapevolutionofaldhfsioxfilms
AT zhangdavidwei opticalpropertiesandbandgapevolutionofaldhfsioxfilms

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