Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography

This paper attempts to compare the main features of random and highly ordered gold nanostructure arrays (NSA) prepared by thermally annealed island film and nanoimprint lithography (NIL) techniques, respectively. Each substrate possesses different morphology in terms of plasmonic enhancement. Both m...

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Detalles Bibliográficos
Autores principales: Lopatynskyi, Andrii M, Lytvyn, Vitalii K, Nazarenko, Volodymyr I, Guo, L Jay, Lucas, Brandon D, Chegel, Volodymyr I
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2015
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4385248/
https://www.ncbi.nlm.nih.gov/pubmed/25852395
http://dx.doi.org/10.1186/s11671-015-0819-1

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4385248/
https://www.ncbi.nlm.nih.gov/pubmed/25852395
http://dx.doi.org/10.1186/s11671-015-0819-1

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