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Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography

This paper attempts to compare the main features of random and highly ordered gold nanostructure arrays (NSA) prepared by thermally annealed island film and nanoimprint lithography (NIL) techniques, respectively. Each substrate possesses different morphology in terms of plasmonic enhancement. Both m...

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Autores principales: Lopatynskyi, Andrii M, Lytvyn, Vitalii K, Nazarenko, Volodymyr I, Guo, L Jay, Lucas, Brandon D, Chegel, Volodymyr I
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2015
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4385248/
https://www.ncbi.nlm.nih.gov/pubmed/25852395
http://dx.doi.org/10.1186/s11671-015-0819-1
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author Lopatynskyi, Andrii M
Lytvyn, Vitalii K
Nazarenko, Volodymyr I
Guo, L Jay
Lucas, Brandon D
Chegel, Volodymyr I
author_facet Lopatynskyi, Andrii M
Lytvyn, Vitalii K
Nazarenko, Volodymyr I
Guo, L Jay
Lucas, Brandon D
Chegel, Volodymyr I
author_sort Lopatynskyi, Andrii M
collection PubMed
description This paper attempts to compare the main features of random and highly ordered gold nanostructure arrays (NSA) prepared by thermally annealed island film and nanoimprint lithography (NIL) techniques, respectively. Each substrate possesses different morphology in terms of plasmonic enhancement. Both methods allow such important features as spectral tuning of plasmon resonance position depending on size and shape of nanostructures; however, the time and cost is quite different. The respective comparison was performed experimentally and theoretically for a number of samples with different geometrical parameters. Spectral characteristics of fabricated NSA exhibited an expressed plasmon peak in the range from 576 to 809 nm for thermally annealed samples and from 606 to 783 nm for samples prepared by NIL. Modelling of the optical response for nanostructures with typical shapes associated with these techniques (parallelepiped for NIL and semi-ellipsoid for annealed island films) was performed using finite-difference time-domain calculations. Mathematical simulations have indicated the dependence of electric field enhancement on the shape and size of the nanoparticles. As an important point, the distribution of electric field at so-called ‘hot spots’ was considered. Parallelepiped-shaped nanoparticles were shown to yield maximal enhancement values by an order of magnitude greater than their semi-ellipsoid-shaped counterparts; however, both nanoparticle shapes have demonstrated comparable effective electrical field enhancement values. Optimized Au nanostructures with equivalent diameters ranging from 85 to 143 nm and height equal to 35 nm were obtained for both techniques, resulting in the largest electrical field enhancement. The application of island film thermal annealing method for nanochips fabrication can be considered as a possible cost-effective platform for various surface-enhanced spectroscopies; while the NIL-fabricated NSA looks like more effective for sensing of small-size objects.
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spelling pubmed-43852482015-04-07 Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography Lopatynskyi, Andrii M Lytvyn, Vitalii K Nazarenko, Volodymyr I Guo, L Jay Lucas, Brandon D Chegel, Volodymyr I Nanoscale Res Lett Nano Express This paper attempts to compare the main features of random and highly ordered gold nanostructure arrays (NSA) prepared by thermally annealed island film and nanoimprint lithography (NIL) techniques, respectively. Each substrate possesses different morphology in terms of plasmonic enhancement. Both methods allow such important features as spectral tuning of plasmon resonance position depending on size and shape of nanostructures; however, the time and cost is quite different. The respective comparison was performed experimentally and theoretically for a number of samples with different geometrical parameters. Spectral characteristics of fabricated NSA exhibited an expressed plasmon peak in the range from 576 to 809 nm for thermally annealed samples and from 606 to 783 nm for samples prepared by NIL. Modelling of the optical response for nanostructures with typical shapes associated with these techniques (parallelepiped for NIL and semi-ellipsoid for annealed island films) was performed using finite-difference time-domain calculations. Mathematical simulations have indicated the dependence of electric field enhancement on the shape and size of the nanoparticles. As an important point, the distribution of electric field at so-called ‘hot spots’ was considered. Parallelepiped-shaped nanoparticles were shown to yield maximal enhancement values by an order of magnitude greater than their semi-ellipsoid-shaped counterparts; however, both nanoparticle shapes have demonstrated comparable effective electrical field enhancement values. Optimized Au nanostructures with equivalent diameters ranging from 85 to 143 nm and height equal to 35 nm were obtained for both techniques, resulting in the largest electrical field enhancement. The application of island film thermal annealing method for nanochips fabrication can be considered as a possible cost-effective platform for various surface-enhanced spectroscopies; while the NIL-fabricated NSA looks like more effective for sensing of small-size objects. Springer US 2015-03-01 /pmc/articles/PMC4385248/ /pubmed/25852395 http://dx.doi.org/10.1186/s11671-015-0819-1 Text en © Lopatynskyi et al.; licensee Springer. 2015 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly credited.
spellingShingle Nano Express
Lopatynskyi, Andrii M
Lytvyn, Vitalii K
Nazarenko, Volodymyr I
Guo, L Jay
Lucas, Brandon D
Chegel, Volodymyr I
Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography
title Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography
title_full Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography
title_fullStr Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography
title_full_unstemmed Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography
title_short Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography
title_sort au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4385248/
https://www.ncbi.nlm.nih.gov/pubmed/25852395
http://dx.doi.org/10.1186/s11671-015-0819-1
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