A flexible transparent gas barrier film employing the method of mixing ALD/MLD-grown Al(2)O(3) and alucone layers

Atomic layer deposition (ALD) has been widely reported as a novel method for thin film encapsulation (TFE) of organic light-emitting diodes and organic photovoltaic cells. Both organic and inorganic thin films can be deposited by ALD with a variety of precursors. In this work, the performances of Al...

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Detalles Bibliográficos
Autores principales: Xiao, Wang, Hui, Duan Ya, Zheng, Chen, Yu, Duan, Qiang, Yang Yong, Ping, Chen, Xiang, Chen Li, Yi, Zhao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2015
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4385290/
https://www.ncbi.nlm.nih.gov/pubmed/25852421
http://dx.doi.org/10.1186/s11671-015-0838-y

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4385290/
https://www.ncbi.nlm.nih.gov/pubmed/25852421
http://dx.doi.org/10.1186/s11671-015-0838-y

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