A new approach of presenting reversible logic gate in nanoscale

Conventional lithography-based VLSI design technology deployed to optimize low-powered-computing and higher scale integration of semiconductor components. However, this downscaling trend confronts serious challenges of tunneling and leakage current increment to the Complementary Metal–Oxide–Semicond...

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Detalles Bibliográficos
Autores principales: Bahar, Ali Newaz, Waheed, Sajjad, Hossain, Nazir
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer International Publishing 2015
Materias:
Research
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4412873/
https://www.ncbi.nlm.nih.gov/pubmed/25932365
http://dx.doi.org/10.1186/s40064-015-0928-4

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4412873/
https://www.ncbi.nlm.nih.gov/pubmed/25932365
http://dx.doi.org/10.1186/s40064-015-0928-4

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