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A new approach of presenting reversible logic gate in nanoscale
Conventional lithography-based VLSI design technology deployed to optimize low-powered-computing and higher scale integration of semiconductor components. However, this downscaling trend confronts serious challenges of tunneling and leakage current increment to the Complementary Metal–Oxide–Semicond...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer International Publishing
2015
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4412873/ https://www.ncbi.nlm.nih.gov/pubmed/25932365 http://dx.doi.org/10.1186/s40064-015-0928-4 |